Advances in resist materials and processing technology XXV (25-27 February 2008, San Jose, California, USA)Henderson, Clifford L.Proceedings of SPIE, the International Society for Optical Engineering. 2008, issn 0277-786X, isbn 978-0-8194-7108-6, 2 v, isbn 978-0-8194-7108-6Conference Proceedings

EUV Resist Development in SeleteKAWAMURA, Daisuke; KANEYAMA, Koji; KOBAYASHI, Shinji et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 692313.1-692313.10, issn 0277-786X, isbn 978-0-8194-7108-6Conference Paper

Lactones in 193 nm resists : What do they do?ITO, Hiroshi; TRUONG, Hoa D; BROCK, Phil J et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 692318.1-692318.12, issn 0277-786X, isbn 978-0-8194-7108-6Conference Paper

Molecular Glass Resists for Next Generation LithographyDE SILVA, Anuja; FELIX, Nelson; JING SHA et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 69231L.1-69231L.14, issn 0277-786X, isbn 978-0-8194-7108-6Conference Paper

New Architectures for High Resolution PatterningDE SILVA, Anuja; FELIX, Nelson; FORMAN, Drew et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 69230O.1-69230O.9, issn 0277-786X, isbn 978-0-8194-7108-6Conference Paper

Self-segregating materials for immersion lithographySANDERS, Daniel P; SUNDBERG, Linda K; BROCK, Phillip J et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 692309.1-692309.12, issn 0277-786X, isbn 978-0-8194-7108-6Conference Paper

Polymer Matrix Effects on Acid GenerationFEDYNYSHYN, Theodore H; GOODMAN, Russell B; ROBERTS, Jeanette et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 692319.1-692319.12, issn 0277-786X, isbn 978-0-8194-7108-6Conference Paper

Quantitative analysis of EUV resist outgassingKOBAYASHI, Shinii; SANTILLAN, Julius Joseph; ITANI, Toshiro et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 692345.1-692345.9, issn 0277-786X, isbn 978-0-8194-7108-6Conference Paper

A calibrated photoresist model for pattern predictionYUNG LONG HUNG; CHUN CHENG LIAO; SHIH, Chiang-Lin et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 692332.1-692332.10, issn 0277-786X, isbn 978-0-8194-7108-6Conference Paper

Development of thick negative photoresists for electroplating applicationsCHUNWEI CHEN; PLASS, Bob; NG, Edward et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 69233E.1-69233E.8, issn 0277-786X, isbn 978-0-8194-7108-6Conference Paper

EUV Resist Outgassing Analysis in SeleteSANTILLAN, Julius Joseph; KOBAYASHI, Shinji; ITANI, Toshiro et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 692342.1-692342.9, issn 0277-786X, isbn 978-0-8194-7108-6Conference Paper

Low Out-Gassing Organic Spin-on HardmaskMINEGISHI, Shinya; YOSHIMURA, Nakaatsu; SATO, Mitsuo et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 69232X.1-69232X.9, issn 0277-786X, isbn 978-0-8194-7108-6Conference Paper

Plasma etch properties of organic BARCsRUNHUI HUANG; WEIGAND, Michael.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 69232G.1-69232G.9, issn 0277-786X, isbn 978-0-8194-7108-6Conference Paper

Post Develop Stain Defect ReductionHARUMOTO, Masahiko; KURODA, Takuya; SUGIYAMA, Minoru et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 69233J.1-69233J.10, issn 0277-786X, isbn 978-0-8194-7108-6Conference Paper

Resist Freezing Process for Double Exposure LithographyCHEN, Kuang-Jung Rex; HUANG, Wu-Song; LI, Wai-Kin et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 69230G.1-69230G.10, issn 0277-786X, isbn 978-0-8194-7108-6Conference Paper

Surface roughness of molecular resist for EUV lithographyTORIUMI, Minoru; KANEYAMA, Koji; KOBAYASHI, Shinji et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 69230L.1-69230L.8, issn 0277-786X, isbn 978-0-8194-7108-6Conference Paper

Acid-Base Equilibrium in Chemically Amplified ResistNATSUDA, Kenichiro; KOZAWA, Takahiro; OKAMOTO, Kazumasa et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 69231A.1-69231A.8, issn 0277-786X, isbn 978-0-8194-7108-6Conference Paper

Characterization of Resist and Topcoat Properties for Immersion LithographyJAIN, Kaveri; HISHIRO, Yoshi.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 692320.1-692320.10, issn 0277-786X, isbn 978-0-8194-7108-6Conference Paper

Effect of Nanofiltration on photochemical IntegrityZHANG, H; WU, A; WEI, J et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 69233H.1-69233H.8, issn 0277-786X, isbn 978-0-8194-7108-6Conference Paper

Highly hydrophobic materials for ArF immersion lithographyTAKEBE, Yoko; SHIROTA, Naoko; SASAKI, Takashi et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 69231U.1-69231U.9, issn 0277-786X, isbn 978-0-8194-7108-6Conference Paper

Molecular resists for EUV and EB lithographyTAKEMOTO, Ichiki; ANDO, Nobuo; EDAMATSU, Kunishige et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 69231N.1-69231N.8, issn 0277-786X, isbn 978-0-8194-7108-6Conference Paper

Processing and Modeling Optimization for Grayscale LithographyDILLON, Thomas; ZABLOCKI, Mathew; MURAKOWSKI, Janusz et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 69233B.1-69233B.13, issn 0277-786X, isbn 978-0-8194-7108-6Conference Paper

Wet trimming process for critical dimension reductionSUN, Sam X; SMITH, Brian A; ANWEI QIN et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 692336.1-692336.11, issn 0277-786X, isbn 978-0-8194-7108-6Conference Paper

Anti-reflective coating for multipatterning lithographyGUERRERO, Douglas J; GIBBONS, Steve; LOWES, Joyce et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 69230X.1-69230X.7, issn 0277-786X, isbn 978-0-8194-7108-6Conference Paper

Double Patterning Study with Inverse LithographyKIM, Sang-Kon.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 692323.1-692323.6, issn 0277-786X, isbn 978-0-8194-7108-6Conference Paper